The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 17, 1985

Filed:

Aug. 04, 1983
Applicant:
Inventor:

Hiroshi Miyamoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 99 ; 355 53 ;
Abstract

A stack of aligned workpieces is placed in a frame body, and a mask is positioned over the stack of workpieces in alignment therewith. The frame body is then moved into an exposure device in which the mask is transferred from the frame body onto a transparent plate and the workpieces are transferred successively from the frame body onto the transparent plate. The workpieces are exposed successively to the mask. The exposed workpieces are then discharged successively out of the exposure device. The mask is transferred from the transparent plate back to the frame body after all of the workpieces have been exposed. The frame body with the mask carried therein is moved out of the exposure device.


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Miyamoto, Hiroshi. (1985). Exposure control method (U.S. Patent No. 4541714). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4541714

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