The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 1985

Filed:

Oct. 21, 1982
Applicant:
Inventors:

Theo Troukens, Oostkamp, BE;

Antoon Mattelin, Oostkamp, BE;

Assignee:

Siemens Aktiengesellschaft, Berlin & Munich, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K / ;
U.S. Cl.
CPC ...
250557 ; 250548 ; 356400 ;
Abstract

A method and apparatus for adjusting the reference system of a pre-programmable laser device relative to the position of an inscription field of a part to be processed such as a silicon wafer characterized by a laser beam from a laser operating in a continuous wave mode being programmed to travel in various search motions with each motion traversing and passing over an edge of the part. The light which is unblocked by the part is received by a photoelectric element to trigger a position signal for each time the light passes across the edge of the wafer. The precise position of the wafer or part relative to the reference system is calculated from the position signals with the assistance of a computer and subsequently the coordinates of the reference system are corrected to match the precise position of the part.


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