The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 27, 1985

Filed:

Sep. 12, 1983
Applicant:
Inventors:

Saburo Nonogaki, Tokyo, JP;

Nobuaki Hayashi, Hachioji, JP;

Yoshifumi Tomita, Mobara, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
430144 ; 430 23 ; 430 25 ; 430 28 ; 430 29 ; 430145 ; 430149 ; 430150 ; 430176 ; 430180 ; 430181 ; 430326 ;
Abstract

A water-soluble, positive-working photoresist composition is disclosed which comprises water-soluble aromatic diazonium salt, water-soluble phenolic compound, and water-soluble polymeric compound. When the film of this composition is irradiated with a pattern of actinic ray and then brought into contact with an alkaline gas or solution, the coating of unexposed areas hardens to become water-insoluble. Preferably, when the film is brought into contact with a suspension of powder or dry powder after being hardened, a positive pattern of powder is obtained by the development with water.


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