The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 1985

Filed:

Jul. 14, 1981
Applicant:
Inventor:

Vladimir Vukanovic, Rochester, NY (US);

Assignee:

The Standard Oil Company (Ohio), Cleveland, OH (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B23K / ; B05D / ;
U.S. Cl.
CPC ...
2191 / ; 2191 / ; 2191 / ; 427 34 ; 427 38 ; 31323151 ;
Abstract

An apparatus for deposition of coatings upon substrates generates a non-local thermal equilibrium arc plasma at the relatively high pressure of at least approximately 1 atmosphere. A closed chamber (25) is defined by a cylindrical anode (11) and annular housings (21, 22) carrying transparent end plates (23, 24). A pencil-shaped cathode (12) is passed through one end plate (23 or 24) coaxially into chamber (25) so that its tapered end (20) is spatially proximate to an exit orifice (44) centrally located in anode (11). Gas ports (30, 31) permit the introduction of a preselected gaseous environment at the desired pressure into chamber (25). A low-current arc is struck between anode (11) and cathode (12) establishing the desired plasma. Two coils (33, 34) are coaxially placed radially outward of both ends of the chamber in a Helmholtz coil configuration to generate a uniform magnetic field in chamber (25) and induce rotation of the arc plasma. The coating material is introduced into the plasma as by a reservoir (40) in cathode (12) and its excited species ejected through exit orifice (44) in a plasma jet for deposition upon any substrate adjacent thereto.


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