The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1985
Filed:
May. 03, 1984
Dainippon Ink and Chemicals, Inc., Tokyo, JP;
Abstract
A method of forming a resist pattern, which comprises printing a predetermined pattern on a substrate by a lithographic technique using a resist ink curable by irradiation of an active energy ray and/or heating, said ink containing (1) a metal chelate resin obtained by reacting (a) at least one resin selected from the group consisting of alkyd resins, modified alkyd resins, fatty acid-modified epoxy resins, urethanized oils and maleinized oils and (b) a metal compound capable of forming a coordination bond using the resin (a) as a ligand and (2) a polymerizable compound containing at least two ethylenically unsaturated bonds per molecule; and curing the printed pattern by irradiating an active energy ray and/or by heating.