The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 1985
Filed:
Apr. 06, 1984
Applicant:
Inventor:
Stephen J Rhodes, Northampton, GB;
Assignee:
Plessey Overseas Limited, Illford, GB;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ; C23F / ;
U.S. Cl.
CPC ...
156643 ; 156644 ; 156646 ; 156652 ; 156653 ; 156655 ; 156656 ; 1566611 ; 156668 ; 2041 / ; 357 71 ; 427 89 ; 430313 ; 430315 ; 430317 ; 430318 ;
Abstract
An integrated circuit processing method comprises the formation on a substrate of a metallized conductor pattern. A layer of insulating material is formed over the conductor pattern and a mask is superimposed thereon. The mask is resistant to plasma etching and is provided at predetermined positions with apertures defining required void outlines. Plasma etching through the mask forms vias in the insulating layer which communicate with the metallized conductor pattern. The mask is removed to leave the integrated circuit with communicating vias which enable connection to the conductor pattern.