The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 1985

Filed:

Jun. 03, 1983
Applicant:
Inventor:

Robert R Whitlock, College Park, MD (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B / ; B05D / ; B05D / ;
U.S. Cl.
CPC ...
428195 ; 372 39 ; 427160 ; 427237 ; 4272481 ; 427272 ;
Abstract

A process for patterning a target for lasing at X-ray wavelengths from materials which cannot be readily shaped. A substrate of one material is placed in a gaseous atmosphere of another material, and the substrate is cooled below the freezing point of the other material so that a frozen layer of the other material condenses onto the substrate. Part of the frozen layer of the other material is masked, and the unmasked part of the frozen layer is vaporized so that the substrate of the one material is coated with the other material according to the pattern of the mask. The target made by the process is also disclosed.


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