The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 1985
Filed:
Jul. 01, 1983
Applicant:
Inventors:
Johannes J Ponjee, Eindhoven, NL;
Christiaan J Verwijlen, Eindhoven, NL;
Assignee:
U.S. Philips Corporation, New York, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C / ;
U.S. Cl.
CPC ...
264338 ; 249115 ; 264-11 ; 264-23 ; 425808 ; 427133 ;
Abstract
A matrix having a surface of silica glass which is suitable for the manufacture of articles of synthetic resin in which the surface of the matrix comprises a monolayer of an aliphatic alcohol, as well as a method of manufacturing articles having a surface of synthetic resin while using the matrix.
Ponjee, Johannes. (1985). Matrix and method of using an aliphatic alcohol coated silica glass (U.S. Patent No. 4534929). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4534929
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile