The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 1985
Filed:
Jun. 13, 1984
Applicant:
Inventors:
Assignee:
Primary Examiner:
Int. Cl.
CPC ...
C25B / ; C23C / ;
U.S. Cl.
CPC ...
2041 / ; 204298 ; 42218603 ; 42218621 ; 42218625 ; 42218629 ;
Abstract
The invention relates to the production of plasma. The process according to the invention comprises the steps of: maintaining a gaseous medium in an enclosure at a pressure in the range of 10.sup.-5 to 10.sup.-1 Torr; exciting this gaseous medium in the enclosure by means of UHF waves in the range of one to ten gigahertz, producing a plasma; and maintaining this plasma in the enclosure by means of a magnetic confinement shell comprising many elongated magnetic elements arranged parallel to each other inside the enclosure near the respective interior surfaces, the faces of the magnetic elements which face the interior of the enclosure having alternating polarities. It is more particularly applicable to the microelectronics industry.