The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 1985

Filed:

May. 24, 1984
Applicant:
Inventors:

Ke-Chin Wang, Pittsburgh, PA (US);

Howard M Winkelbauer, Mifflin, PA (US);

Assignee:

Dresser Industries, Inc., Dallas, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B / ; C04B / ; C04B / ;
U.S. Cl.
CPC ...
501 97 ; 501120 ; 501127 ; 501128 ;
Abstract

This invention relates to a method for producing nitride bonded refractory shapes in which the bonding matrix is formed in situ. The method comprises forming a batch including a coarser portion selected from the group calcined and fused aggregates of alumina, aluminosilicate, and magnesium aluminate spinel and a finer portion consisting essentially of finely divided silicon metal and alumina as well as fines of the above mentioned refractory aggregate needed to achieve the desired screen analysis. The silicon metal and alumina react in the nitriding atmosphere to form a low porosity matrix generally comprising silicon oxynitride with corundum distributed therethrough.


Find Patent Forward Citations

Loading…