The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 1985

Filed:

Mar. 14, 1983
Applicant:
Inventor:

Wei C Lu, Rochester, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
355 / ; 355 / ; 118657 ; 118658 ; 430122 ;
Abstract

A magnetic brush developer apparatus for developing an electrostatic charge pattern on a member by contacting the member with particulate magnetic developer material, such material being contained within the zone of contact to prevent uncontrolled escape from the zone and contamination of the environs. The apparatus includes an applicator for transporting developer material in a non-agitated state into contact with the charge pattern on the member. A portion of the developer material in contact with such charge pattern is magnetically agitated to form in such material an agitated zone bounded by the non-agitated material to establish a sealing zone about the agitated zone.


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Lu, Wei. (1985). Magnetic brush developer apparatus (U.S. Patent No. 4533229). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4533229

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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