The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 1985
Filed:
Jun. 17, 1983
Applicant:
Inventor:
John W Reeds, Thousand Oaks, CA (US);
Assignee:
Hughes Aircraft Company, El Segundo, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
2504421 ; 2504401 ;
Abstract
Base plate 32 of the wafer support is flexibly mounted with respect to the floor 34 of the target chamber. Flanges 54 and 58 flex by operation of motor 68 to adjust the position of the wafer support with respect to the focal point of the column.
Reeds, John. (1985). Wafer height correction system for focused beam system (U.S. Patent No. 4532426). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4532426
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile