The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 30, 1985
Filed:
Dec. 28, 1983
Applicant:
Inventors:
Isaac L Smith, Baton Rouge, LA (US);
Gunner E Nelson, Baton Rouge, LA (US);
Assignee:
Ethyl Corporation, Richmond, VA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
423347 ; 423210 ; 423299 ; 436103 ; 436182 ;
Abstract
A process for the removal of and analysis of phosphine and arsine impurities in silane gas. Silane gas which normally contains the impurities of AsH.sub.3 and PH.sub.3 is contacted with a solution of NaAlH.sub.4 in dimethoxyethane, other ether or amine to remove the impurities therefrom. The dimethoxyethane or other ether solution may then be hydrolyzed with water or alcohol to evolve hydrogen gas from the NaAlH.sub.4 and to re-evolve phosphine and arsine which may then be quantitatively determined by gas chromatography, atomic absorption, or other means.