The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 23, 1985
Filed:
Sep. 29, 1983
Hiroshi Hara, Tokyo, JP;
Takashi Tobioka, Saitama, JP;
Takeshi Yoshino, Saitama, JP;
Tetuo Nishikawa, Saitama, JP;
Jiro Sekine, Tokyo, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
An exposure aperture frame defining an exposure aperture includes at least a pivotable partition member with an inclined guide surface on the inner wall thereof which is pivoted by and thereby permits advancement of a film leader to a film take-up chamber so that the film leader can reach a film take-up chamber without any standstill within the exposure aperture frame. The inclined guide surface permits the forward end of the film leader to ride across the partition member. A spring urges the partition member toward a position in which it encloses the exposure aperture frame. That spring also releasably retains the partition member on a shaft on which it is pivoted. The partition member has a platform member extending toward the take-up chamber, which has an opening therethrough that provides access to the spring.