The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 1985
Filed:
Mar. 23, 1982
Shunichi Koyanagi, Kanagawa, JP;
Hajime Kitamura, Chiba, JP;
Toshihide Shimizu, Chiba, JP;
Ichiro Kaneko, Ibaraki, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Abstract
The invention provides a very efficient method with highly durable effect for preventing polymer scale deposition on the reactor walls and other surfaces coming into contact with the monomer during polymerization of an ethylenically unsaturated polymerizable monomer in an aqueous medium such as in the suspension polymerization of vinyl chloride. The method comprises coating the reactor walls, prior to polymerization, with a novel coating material which is a condensation product obtained by the condensation reaction of an aromatic amine compound such as aniline and an aromatic nitro compound such as nitrobenzene in the presence of a mineral acid and a specified condensation catalyst. It is sometimes preferable that the condensation product is basified or treated with an alkali or ammonium compound to be imparted with a modified solubility behavior.