The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 1985
Filed:
Mar. 07, 1984
Christopher M Horwitz, Summer Hill, AU;
Unisearch Limited, Kensington, AU;
Abstract
There is disclosed a dry process etching or deposition chamber which allows an improvement in process speed and control of directionality over prior art dry process chambers. The etching or deposition chamber is provided with a hollow cathode electrode comprising two parallel electrode surfaces which are maintained at substantially the same electrical potential while a radio frequency potential is applied between the hollow cathode electrode and an anode electrode which is also located within the chamber. During the etching or deposition process, a partial vacuum is maintained in the dry process chamber and a gas is introduced into the chamber to provide a source of halogen ions and carbon or silicon ions under radio frequency excitation these ions forming a chemically reactive plasma. Products of the etching or deposition process can be pumped out of the chamber during the processing step if greater performance is required.