The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 1985
Filed:
Jun. 30, 1983
John A Quinn, Morganville, NJ (US);
James W O'Neil, Howell, NJ (US);
E. I. Du Pont de Nemours and Company, Wilmington, DE (US);
Abstract
Process of enlarging image areas covered by a stencil or relief image area formed in a photopolymer mask consisting essentially of (a) contacting said image area with a swelling agent and optionally a diluent to effect enlargement, and (b) removing excess swelling agent, i.e., evaporation, air impingement including heating. Additional image enlargement is possible by further contacting the image with a more concentrated swelling agent. The process is particularly useful in enlarging halftone image dots of photopolymer litho masks wherein the halftone image areas consist of hardened upper skins which rest on softer undervolumes having a lesser degree of polymerization or hardening.