Silver halide photographic light-sensitive materials with antistatic

Abstract

A silver halide photographic light-sensitive material is disclosed. The photographic material is comprised of a support base, a silver halide emulsion layer and an antistatic layer. The antistatic layer contains a nonionic surface active agent having two polyoxyethylene chains in a molecule represented by the formula (I): ##STR1## wherein R.sub.1 and R.sub.3 each represents a substituted or unsubstituted alkyl group, an aryl group, an alkoxy group, a halogen atom, an acyl group, an amido group, a sulfonamido group, a carbamoyl group or a sulfamoyl group, R.sub.2 and R.sub.4 each represents a hydrogen atom, a substituted or unsubstituted alkyl group, an aryl group, an alkoxy group, a halogen atom, an acyl group, an amido group, a sulfonamido group, a carbamoyl group or a sulfamoyl group, R.sub.5 represents a hydrogen atom, a methyl group or an .alpha.-furyl group, and m and n independently represents an average degree of polymerization of ethylene oxide, which is 2 to 40. By utilizing the compound of general formula (I) it is possible to obtain a photographic material which aids in eliminating screen contamination. The compound has good antistatic properties which do not change with the passage of time. Furthermore, the compound does not have undesirable effects on the photographic properties of the photographic material.