The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 1985
Filed:
Aug. 31, 1983
Didier S Meignant, Emerainville, FR;
U.S. Philips Corporation, New York, NY (US);
Abstract
The invention relates to a method of providing a small-sized opening for manufacturing semiconductors, such as field effect transistors having an aligned gate in the submicron range, as well as to transistors obtained by this method. In general, the invention consists in that an intermediate window is formed to provide the aligned gate in a semiconductor, which window is eliminated after forming the gate. The invention is used in the field of electronics, more particularly, in the manufacture of semiconductor elements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile