The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1985
Filed:
Jan. 27, 1983
Robert Zwirn, Los Angeles, CA (US);
Edward J Dragavon, Los Angeles, CA (US);
Brian Smithgall, Hermosa Beach, CA (US);
Hughes Aircraft Company, El Segundo, CA (US);
Abstract
In this invention, the resolution is enhanced by first effectively decreasing the scan angle subtended between adjacent samples significantly below that of the Rayleigh limit to obtain an image blurred by the point spread function (or diffraction pattern) of the aperture. The next step is to process this blurred image to at least partially remove the blur. The unblurring process consists of convolving this finely sampled blurred image with a specially designed convolution mask. This mask effectively outputs an enhanced pixel at each step of the convolution. The mask simultaneously performs the equivalent of the following operations: