The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1985
Filed:
Oct. 12, 1982
Applicant:
Inventors:
Yoshiaki Tomisawa, Hitachi, JP;
Seiji Kinoda, Fujisawa, JP;
Eiji Fujita, Hitachi, JP;
Masanori Murata, Hitachi, JP;
Toshio Takeuchi, Hitachi, JP;
Ken Ogawa, Hitachi, JP;
Assignee:
Hitachi Chemical Company, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430399 ; 430398 ; 134 10 ; 134 11 ; 210705 ; 210706 ; 210712 ;
Abstract
A developing or peeling solution for developing or imagewisely peeling an alkali-type photosensitive film containing a suspension of released photosensitive film is regenerated by introducing one or more reagents and a gas for depositing the suspension in floating state and removing the floated deposit by a skimmer from the developing or peeling solution. The regenerated developing or peeling solution can be used again and again for the development or peeling.