The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 1985

Filed:

Nov. 03, 1983
Applicant:
Inventors:

Kenji Okamoto, Osaka, JP;

Yoshikazu Nishiwaki, Osaka, JP;

Shunji Matsuoka, Osaka, JP;

Yozo Nishiura, Osaka, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430321 ; 1566591 ; 427162 ;
Abstract

A process for making a diffraction grating pattern on a substrate is disclosed. The process comprises the steps of coating the substrate with first and second materials, with one of the materials defining a selected area for the diffraction grating pattern, and the other material covering the substrate while forming a window at that portion of the substrate where the diffraction grating is desired. The window portion of the substrate is then etched, and the first and second materials are stripped off in order to leave behind the diffraction grating pattern at the desired location of the substrate.


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