The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 1985
Filed:
Jul. 01, 1983
Marilyn J Harney, Painesville, OH (US);
Elvin M Vauss, Jr, Cleveland, OH (US);
Ajit Y Sane, Willoughby, OH (US);
Eltech Systems Corporation, Boca Raton, FL (US);
Abstract
A self-supporting reticulate of titanium hydride (TiH.sub.2) is formed by slurry-coating an open cell organic synthetic resinous material, or other pore-former, and eliminating the carbon-containing components of binder and/or solvent, viscosity modifiers, thickening agents, and the like at a temperature below about 400.degree. C. In an analogous manner, an inorganic refractory material open cell substrate or other pore-former substrate may be slurry-coated and converted to a TiH.sub.2 reticulate in which the substrate is coated with TiH.sub.2 to yield a supported TiH.sub.2 reticulate. Either the self-supporting TiH.sub.2 reticulate, or the supported one, free of carbonaceous material, may be sintered to yield an essentially pure Ti (metal) reticulate which is essentially free of titanium carbide. Ti reticulates so formed are coated with Pt group metal oxides and used as anodes in chloroalkali cells.