The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 14, 1985

Filed:

Jun. 23, 1982
Applicant:
Inventors:

Kantilal Jain, San Jose, CA (US);

Milton R Latta, San Jose, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B / ;
U.S. Cl.
CPC ...
350 9624 ; 350-372 ; 350 9618 ; 350167 ;
Abstract

A laser light source for a high resolution projection lithography system and transforming optical apparatus which transforms the laser light into an optically equivalent self-luminous curved line source. The transforming optical apparatus comprises a two-dimensional array of fly's eye lenses positioned to intercept light from the light source and to produce a series of point sources having a selected numerical aperture. An optical fiber array is positioned so that the imput end of each fiber receives the light output from one of the lenses in the array. The position of the fibers is chosen so that light from the lenses underfills the fibers to preserve the numerical aperture. The output ends of the fibers are arranged in position to produce a curved line source of a desired shape. Alternate embodiments are described in which lens arrays can be selectively positioned to change the numerical aperture of the transforming optical apparatus.


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