The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 1985
Filed:
Feb. 06, 1984
Applicant:
Inventors:
Harry W Deckman, Clinton, NJ (US);
John H Dunsmuir, Annandale, NJ (US);
Assignee:
Exxon Research and Engineering Co., Florham Park, NJ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156630 ; 156633 ; 156643 ; 156646 ; 1566591 ; 156657 ; 156660 ; 156667 ; 2041 / ;
Abstract
The present invention is an improved replication process which copies a master pattern onto an intermediate transfer mask which is then used to form a lithographic mask on the surface of a substrate. A pattern derived from the original master pattern is then produced in the substrate by an etching process.