The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 1985
Filed:
Jan. 16, 1984
Robert L DeGood, Lee's Summit, MO (US);
Eddie R Malcolm, Independence, MO (US);
Fike Metal Products Corporation, Blue Springs, MO (US);
Abstract
A two directional rupture disc assembly is provided which serves in a fluid reactor system as a safety relief valve when a critical condition, such as predetermined pressure positive or negative, is encountered. That is, the rupture disc assembly hereof is operatively coupled to a reactor vessel and allows fluid flow in one direction when one reactor system condition is encountered and allows fluid flow in an opposite direction when another reactor system condition is encountered. Thus, under normal conditions, the reactor system operates in a certain pressure range with the assembly hereof in flow blocking disposition, but if a reactor condition outside of the normal operating range is encountered, the assembly ruptures to permit fluid flow in the appropriate direction. Preferably, the rupture disc assembly includes a pair of flat rupture discs and an imperforate membrane between the two discs. Each disc includes an innermost and outermost C-shaped pattern formed by a plurality of serially arranged slots through the respective disc. Advantageously, the discs and membrane are mounted and the patterns manufactured such that the discs rupture adjacent the outermost pattern when one condition is encountered and the discs rupture adjacent the innermost pattern when another condition is encountered.