The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 1985

Filed:

Feb. 02, 1983
Applicant:
Inventors:

Takatoshi Shimomura, Ibaraki, JP;

Fumio Fujita, Osaka, JP;

Manabu Hirakawa, Ibaraki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
528489 ; 20415914 ; 204165 ; 2105002 ; 528492 ;
Abstract

A process for producing a semipermeable membrane having a high flux, excellent in solute rejection and useful for reverse osmosis, ultrafiltration and the like which comprises dipping a semipermeable membrane of acrylonitrile polymer containing 40-100% by mole of acrylonitrile in a solution of an amine and/or an alkali, or casting a solution of said polymer containing an amine and/or an alkali to prepare a semipermeable membrane, and optionally, treating the semipermeable membrane thus obtained with plasma.


Find Patent Forward Citations

Shimomura, Takatoshi. (1985). Process for producing semipermeable membrane (U.S. Patent No. 4511711). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4511711

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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