The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 16, 1985

Filed:

Jan. 18, 1983
Applicant:
Inventors:

Akio Yanai, Kanagawa, JP;

Ryuji Shirahata, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427 38 ; 118 501 ; 118723 ; 118726 ; 118729 ; 2041 / ; 427 39 ; 427 42 ; 427132 ; 427250 ; 427251 ; 427294 ;
Abstract

A system of manufacturing a magnetic recording medium in which a magnetic metal or alloy is heated and evaporated by an electron beam gun so that vacuum-evaporated magnetic film is formed on a non-organic or organic macromolecular base. A plasma generating coil is disposed near an evaporating source and an electron beam passes through the hollow portion of the coil in preferably a direction coaxial with the axis of the coil. High frequency power is applied to the coil and vacuum deposition is carried out with a plasma generated thereby. The flow of vapor of magnetic metal or alloy is applied obliquely to the base and an oxidation gas is introduced into a vacuum container for forming the magnetic film.


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