The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 1985
Filed:
Oct. 20, 1982
Applicant:
Inventors:
Eiichi Izumi, Takahagi, JP;
Hifumi Tamura, Hachioji, JP;
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J / ; G01N / ;
U.S. Cl.
CPC ...
250309 ; 250306 ; 250307 ;
Abstract
In ion micro-analysis, intensity of at least one species of secondary ions is monitored, and a reference etching time required for etching an implanted depth of primary ions is determined from a profile of a secondary ion intensity signal. Analysis time is graduated on the basis of the reference etching time to represent an analysis signal with the scale of the depth. The primary ions are non-volatile and may be active ions which react with a specimen or metal ions. The analyzed depth can be found during the analysis to prevent unwanted analysis and assure rapid data processing.