The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 09, 1985

Filed:

Jan. 19, 1983
Applicant:
Inventors:

Takeshi Hachisu, Ibaraki, JP;

Keiji Taguchi, Ibaraki, JP;

Toshimi Sasaki, Mito, JP;

Tetsuo Matsumoto, Tsuchiura, JP;

Nobuyoshi Hidao, Kashiwa, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C21D / ;
U.S. Cl.
CPC ...
148143 ; 2394285 ;
Abstract

A quenching method wherein an object to be quenched is sprayed with a mixed spray jet of a liquid and a gas. The diameter of droplets in the mixed spray jet is from 50 to 200 .mu.m, and the mixing ratio between the liquid and the gas is varied during the period from the start to the end of cooling. Also disclosed is a quenching apparatus having nozzles for spraying an object to be quenched with a mixed spray jet of a liquid and a gas, a liquid supply source for supplying a pressurized liquid, and a gas supply source for supplying a pressurized gas. Each of the nozzles has a liquid-jetting port formed in the surface opened to the atmosphere and a gas-jetting port annularly formed around the liquid-jetting port on the same plane. The liquid-jetting port is communicated with the liquid supply source, while the gas-jetting port is communicated with the gas supply source. A flow rate regulating valve for regulating the flow rate of the pressurized liquid is disposed between the liquid-jetting port and the liquid supply source, while a flow rate regulating valve for regulating the flow rate of the pressurized gas is disposed between the gas-jetting port and the gas supply source.


Find Patent Forward Citations

Loading…