The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 1985
Filed:
May. 23, 1983
Agfa-Gevaert Aktiengesellschaft, Leverkusen, DE;
Abstract
In a process and an apparatus for the exposure and development of photographic images according to the dye diffusion process a monosheet material is used, the laminated structure of which is divided by a layer which is impermeable to light but permeable to moisture into a photosensitive side of the sheet for image-wise exposure and a non-photosensitive side for observation and supplying the activator or developer solution. The said monosheet material is exposed image-wise in the dark and the photosensitive side then sealed in a light and moisture proof manner in a development apparatus in which the non-photosensitive side of the monosheet lies open and is exposed to an activator in daylight so that the image formation takes place visibly. Once the image quality has been achieved the development is stopped by removing the activator and by subsequent rinsing. The monosheet is dried in a conventional manner but only on one side.