The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 02, 1985
Filed:
Mar. 08, 1984
Applicant:
Inventors:
Keith G Bartlett, Ft. Collins, CO (US);
Mary A Caolo, Ft. Collins, CO (US);
Assignee:
Hewlett-Packard Company, Palo Alto, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
1566591 ; 156653 ; 156657 ; 1566611 ; 156662 ; 252 793 ; 252 794 ;
Abstract
An etching solution for the dissolution of silicon dioxide through a portable conformable mask, with PMMA as the etch stop layer, has been developed which eliminates resist lifting and non-uniform lateral etching, thereby providing the improved oxide edge definitions required for 1 micron line geometries in VLSI chips.
Bartlett, Keith. (1985). Polymethyl methacrylate compatible silicon dioxide complexing agent (U.S. Patent No. 4508591). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4508591
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile