The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 26, 1985

Filed:

Dec. 27, 1983
Applicant:
Inventors:

Kazumasa Chiba, Nagoya, JP;

Kazuhiko Kobayashi, Nagoya, JP;

Tosaku Susuki, Otsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
528312 ; 525420 ; 528313 ; 528314 ; 528315 ; 528317 ; 528323 ;
Abstract

A block copolyamide having effectively improved impact strength is obtained by polymerizing a mixture comprising substantially from about 50 to about 95 parts by weight of lactam and from about 50 to about 5 parts by weight of polyol in the presence of catalyst for an anionic polymerization and activator represented by the following formula (I); ##STR1## wherein A denotes a bifunctional organic residue having at least one kind of heteroatoms selected from the group consisting of N, O, S, F, Cl, Br and I, and Y and Y' denote an acyl group selected from the group consisting of ##STR2## respectively, and n and n' denote an integer of 3 to 11 respectively, or by polymerizing, in the presence of catalyst for anionic polymerization, a mixture comprising substantially from about 50 to about 95 parts by weight of lactam and from about 5 to about 50 parts by weight of prepolymer obtained by a reaction of polyol and activator represented by the above formula (I), wherein A denotes a bifunctional aromatic residue having at least one halogen atom attached to the aromatic ring, and Y, Y', n and n' denote the same.


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