The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 1985
Filed:
Jul. 14, 1983
Applicant:
Inventors:
Tetsuji Arai, Kobe, JP;
Mitsuru Ikeuchi, Imabari, JP;
Assignee:
Ushio Denki Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
148-15 ; 2957 / ; 2957 / ; 148187 ; 357 91 ; 219354 ;
Abstract
A method for annealing semiconductors wherein a semiconductor wafer is placed on a table and a plurality of flash discharge lamps are disposed in a plane parallel and adjacent to the semiconductor wafer. A plane mirror is disposed in a plane parallel and adjacent to the plane of the flash discharge lamps on the side opposite from the table. The semiconductor wafer is exposed to irradiation by light from the flash discharge lamps, whereby the wafer is instantaneously annealed uniformly over the entire area thereof.