The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 1985

Filed:

Sep. 01, 1982
Applicant:
Inventors:

Shingo Watanabe, Himeji, JP;

Takeo Itou, Fukaya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430 25 ; 430 28 ; 430 29 ; 430176 ; 430196 ; 430197 ;
Abstract

A method for forming a pattern of a non-light-emitting black material on the inner surface of a faceplate of a color cathode ray tube is provided, which comprises the steps of:


Find Patent Forward Citations

Watanabe, Shingo. (1985). Method for forming pattern and photoresist used therein (U.S. Patent No. 4501806). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4501806

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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