The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 26, 1985
Filed:
Oct. 28, 1982
Applicant:
Inventors:
Assignee:
Shigematsu Works Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A62B / ;
U.S. Cl.
CPC ...
12820615 ; 12820617 ;
Abstract
A mask in which an enclosure of an intake filtration chamber is partly or totally formed of a filtration medium so that a separate filtration medium need not be provided within the intake filtration chamber for replacement. The replacement of the filtration medium is effected by replacement of the entire intake filtration chamber. The invention provides a mask which is small in size and low in intake resistance and is free from a possible flow of contaminated air into the mask.