The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 19, 1985

Filed:

Dec. 27, 1982
Applicant:
Inventor:

Robert W Schumann, Madison, WI (US);

Assignee:

Nicolet Instrument Corporation, Madison, WI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
354-4 ;
Abstract

A photoplotter wherein a relative movement is produced between a photosensitive media and a radiant energy pattern generated on the media. The relative movement is in accordance with a desired exposure trace on the media. A difference between actual and desired relative movement is detected and the radiant energy pattern is varied to compensate for that difference. In a preferred embodiment, the radiant energy pattern is established by a pattern generator which displays an alterable pattern object on its face the position of the pattern object on the face being variable to compensate for the difference between actual and desired relative movement. The pattern object may be generated as a linear trace on a cathode ray tube (CRT) with the number of linear traces generated per unit of time being dependent on the relative movement velocity. The pattern images on the media resulting from the linear CRT traces or pattern objects overlap to provide a continuous exposure pattern along the desired exposure trace.


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