The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 1985
Filed:
Nov. 01, 1982
Alfred De Ferrari, Huntington, CT (US);
William H Doddman, Trumbull, CT (US);
Avco Corporation, Stratford, CT (US);
Abstract
A powder feed system with a recirculator is provided for a plasma spray apparatus so that spraying operations may be started and stopped abruptly. The subject system utilizes a pressurized gas to direct a powdered material from a powder feed hopper to the plasma spray applicator. A diverter valve is located intermediate the powder feed hopper and the plasma spray applicator and in close proximity to the plasma spray applicator for selectively diverting the powdered material toward or away from the plasma spray applicator. Powdered material diverted away from the plasma spray applicator is directed to a powder accumulator for subsequent reuse. The powdered material is kept in continuous motion during both spraying and diverting operations thereby avoiding the need to overcome inertia each time spraying operations are commenced. Furthermore, because of the close proximity of the diverter valve to the plasma spray applicator, spraying operations may be started and stopped abruptly with little or no transition period of variable flow rate. In a preferred embodiment the powder accumulator is in communication with the powder feed hopper thereby facilitating the recirculation and reuse of the diverted powdered material.