The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 1985

Filed:

Nov. 25, 1983
Applicant:
Inventors:

Hubert Aulich, Munich, DE;

Karl-Heinz Eisenrith, Schliersee, DE;

Hans-Peter Urbach, Munich, DE;

Assignee:

Siemens Aktiengesellschaft, Berlin and Munich, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
148191 ; 65-31 ; 65-311 ; 65-315 ; 65 31 ; 29572 ; 148-15 ; 2041 / ; 136258 ; 136261 ; 427 74 ; 427 86 ; 427309 ; 4274342 ;
Abstract

The invention concerns a process for the manufacture of substrates from carbon-coated SiO.sub.2 fabric that can be used for large-surface silicon bodies, in which mineral materials or waste containing SiO.sub.2 are used as starting materials and a mixture of Al.sub.2 O.sub.3 and oxides of the alkaline and/or alkaline earth metals is used as a flux for the transformation into the glass phase. The glass fibers made from the homogenous glass melt are processed into a glass fabric, which is then subjected to an acid leaching process and coated with carbon. The process is used for the low-cost production of substrates for silicon bodies that are manufactured according to the strip-coating process for use in solar cells.


Find Patent Forward Citations

Loading…