The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 1985
Filed:
May. 01, 1984
Applicant:
Inventor:
Rajiv R Shah, Plano, TX (US);
Assignee:
Texas Instruments Incorporated, Dallas, TX (US);
Primary Examiner:
Int. Cl.
CPC ...
G02F / ;
U.S. Cl.
CPC ...
350354 ; 350-362 ; 350393 ;
Abstract
An apparatus and method of photolithography with phase conjugate optics having a pump nonlinear medium for producing four way mixing of a beam of coherent electromagnetic radiation incident to said nonlinear medium with a spatically modulated representation of image thereon. The nonlinear medium producing by the phenomenon of four way mixing. A phase conjugated beam having a representation of the image spatically amplitude modulated thereon. The phase conjugated beam is directed toward a surface sensitive to electromagnetic radiation.