The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 15, 1985
Filed:
Mar. 27, 1984
Applicant:
Inventor:
Imants R Lauks, Sewell, NJ (US);
Assignee:
University Patents, Inc., Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430270 ; 427240 ; 427241 ; 427377 ; 427 87 ; 430272 ; 430273 ; 430311 ; 430327 ;
Abstract
Amorphous chalcogenide films substantially free from particulate and microstructure are formed on a substrate from solution. The solution contains a glass-forming chalcogenide compound dissolved in a non-aqueous vaporizable solvent, such as a low molecular weight amine, and is substantially free from particulate or crystallizable material. Film formation is effected by coating the solution onto the substrate in a non-vacuumized environment, and thereafter evaporating the solvent from the coating. The procedure is particularly useful in forming amorphous chalcogenide resists for photolithographic applications.