The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 01, 1985

Filed:

Jul. 06, 1982
Applicant:
Inventors:

Friedrich Hanstein, Gross-Zimmern, DE;

Peter R Szigeti, Buettelborn, DE;

Assignee:

Rohm GmbH, Darmstadt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B / ;
U.S. Cl.
CPC ...
51358 ; 51263 ; 51267 ; 51292 ;
Abstract

A polishing plate for polishing the surface of synthetic resins has a rigid disk and a compressible cover abutting a lower surface of the rigid disk. The rigid disk has an inlet opening formed centrally therein and a plurality of channels formed in the lower surface thereof. The cover has a plurality of layers including an upper layer of soft foam adjacent the lower surface of the rigid disk, a lower layer having a textile surface structure and which contacts a surface to be polished, and a middle layer which is permeable to liquid and interposed between the upper and lower layers. A method of polishing a surface has as its first step supplying a polishing agent to a central opening formed in a rigid disk. The polishing agent is then uniformly distributed to an upper portion of a cover which is adjacent a lower surface of the disk through a plurality of channels formed in the lower surface of the disk, the channels communicating with the central opening to allow the polishing agent to flow therethrough. Next, the polishing agent is supplied to a lower portion of the cover through a plurality of access openings formed in the cover and disposed below the channels. The polishing agent is then uniformly applied to the surface to be polished by permeation of the polishing agent through the lower portion of the cover.


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