The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 18, 1984
Filed:
Sep. 16, 1983
Applicant:
Inventors:
Alvin M Goodman, Princeton Township, Mercer County, NJ (US);
Herman F Gossenberger, North Brunswick Township, Middlesex County, NJ (US);
Assignee:
RCA Corporation, New York, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 85 ; 427 86 ; 427 95 ; 427255 ; 4272553 ;
Abstract
A plurality of wafers is serially disposed between a reactant gas inlet portion and an exhaust gas outlet portion of a deposition chamber. The reactant gas comprises a predetermined mixture of N.sub.2 O and SiH.sub.4, and a positive, monotonically decreasing temperature gradient is provided between the wafer closest to the inlet portion to the wafer closest to the outlet portion, such that the thickness and resistivity of the deposited SIPOS (semi-insulating polycrystalline silicon) are substantially similar on each wafer.