Planetary substrate support apparatus for vapor vacuum deposition coating

Abstract

A substrate support apparatus (40) for reliably rotatably supporting substrates being coated within an evacuated physical vapor deposition chamber, is disclosed. A base member (41) defining one or more work stations (43) is configured and mounted for movement within a deposition coating chamber (20) such that the work station(s) move along a closed path in the chamber, past one or more coating material sources (25). Substrate holder assemblies (50), configured to support one or more substrates (30) to be coated, are mounted for rotation about auxiliary axes (47) at selectable ones of the work stations. Unique bearing means (65, 67), operable over wide temperature variations, rotatably support the substrate holder assemblies and provide good electrical conduction from the base member (41) to the substrates (30). Bearing surfaces (67b) are protected from contamination by the coating plasma (25a). Independent activating means (70, 72) selectively engage and rotate the substrate holder assemblies through predetermined numbers of degrees, at selected positions along the closed path. A simple vane configuration (62, 63) is used for accepting the activating forces. Stabilizing means (80) are provided for supporting unstable substrates upon the substrate holder assemblies (50). Simple attachment and removal of the substrate holder assemblies (50) to and from the base member (41) enhances use-flexibility of the apparatus.