The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 1984

Filed:

Mar. 28, 1983
Applicant:
Inventors:

Tadao Matsuo, Hyogo, JP;

Shuji Mori, Hyogo, JP;

Kenzo Tanaka, Aichi, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ; C08L / ; C08L / ;
U.S. Cl.
CPC ...
525123 ; 525183 ; 525184 ;
Abstract

A process for producing high impact block copolyamide is described, comprising anion polymerizing .omega.-lactam in the presence of a prepolymer polymerization accelerator. The prepolymer is prepared by reacting a butadiene homopolymer and/or butadiene-acrylonitrile copolymer containing hydroxyl groups at the terminals thereof with polymethylene polyphenylene isocyanate or tolylene diisocyanate at an equivalent ratio of isocyanate group to hydroxyl group (NCO/OH) of 1:1 or more. With the thus-produced high impact block copolyamide, impact strength is greatly improved, and bleeding of polybutadiene is not observed.


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