The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 1984

Filed:

May. 04, 1982
Applicant:
Inventors:

Kenji Miwa, Kawasaki, JP;

Noriyoshi Hashimoto, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B65G / ;
U.S. Cl.
CPC ...
198394 ;
Abstract

An alignment apparatus for positioning a substrate in a determined position comprises three rotating rollers having outer circumferences contactable with the circumference of the substrate at three different portions thereof. A first roller and at least one of the remaining rollers are driven to rotate the substrate in a predetermined direction. A holder holds the first roller and is displaceably biased toward the remaining rollers. A rotation inhibitor comes into close contact with a flat on the substrate when the substrate comes to a predetermined rotated position in which the flat and the first roller are in opposition to each other. The rotation inhibitor is provided integrally with the holder in such a predetermined positional relation to the first roller that as a result of the close contact with the flat of the substrate, the inhibitor can inhibit the holder from being moved in the direction for contact between the first roller and the flat.


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