The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 1984
Filed:
Jun. 30, 1981
Applicant:
Inventor:
John M Madey, Palo Alto, CA (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01S / ;
U.S. Cl.
CPC ...
372-2 ;
Abstract
A gain-expanded free electron laser in which a relativistic electron beam exchanges energy with an electromagnetic wave in an interaction region defined by a magnet system is configured to suppress betatron excitation. The magnet system, the electromagnetic wave, and electron beam are characterized by a net optical phase slip qL during the interaction between the phase of the electromagnetic wave and the phase of the electron transverse velocity, and a net betatron phase advance .LAMBDA.L. The optical phase slip and the betatron phase advance are chosen to satisfy the following constraints