The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 1984
Filed:
Feb. 16, 1982
Yasuo Ishiguro, Tokyo, JP;
Copal Company Limited, Tokyo, JP;
Konishiroku Photo Industry Co., Ltd., Tokyo, JP;
Abstract
An exposure controlling device comprising a means of discriminating to what zone of exposure zones sectioned in advance an exposure value determined by considering the brightness information of an object to be photographed obtained by a TTL light measurement under the maximum diaphragm aperture and the film sensitivity of the film to be used belongs, a means of determining a diaphragm value simultaneously with and in response to the discrimination of the exposure zone and a means of comparing the determined diaphragm value with the F-number of a photographing lens to be used and controlling a proper exposure time corresponding to said diaphragm value so that a diaphragm aperture and shutter speed for obtaining a proper exposure can be automatically set without making any special switching operation even in the case of using any photographing lens different in the F-number. The means of determining the diaphragm value includes a member which can be intermittently driven by a pulse signal. By the initial motion of this member, a mirror mechanism or automatic focus adjusting device can be released.