The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 1984
Filed:
Jul. 07, 1983
Masatoshi Hayakawa, Chigasaki, JP;
Koichi Aso, Yokohama, JP;
Satoru Uedaira, Yokohama, JP;
Yoshitaka Ochiai, Yokohama, JP;
Hideki Matsuda, Yokohama, JP;
Kazuhide Hotai, Sendai, JP;
Kazuhiko Hayashi, Yokohama, JP;
Sony Corporation, Tokyo, JP;
Abstract
Annealing method for an amorphous magnetic alloy including the steps of preparing an amorphous magnetic alloy film, and annealing the amorphous magnetic alloy film at an elevated temperature lower than Curie temperature and crystallization temperature of the amorphous magnetic alloy film under an application of a repetition of alternately applied a first magnetic field and a second magnetic field, in which the first magnetic field is applied along one direction in a major surface of the amorphous magnetic alloy film for a predetermined period, and the second magnetic field is applied along a second direction perpendicular to the one direction in the major surface of the amorphous magnetic alloy film for the predetermined period.