The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 1984
Filed:
Oct. 08, 1982
David J Tjornehoj, Longmont, CO (US);
Donald E Dick, Boulder, CO (US);
Richard E Kiefer, Boulder, CO (US);
Fred L Smith, III, Boulder, CO (US);
Armco Inc., Middletown, OH (US);
Abstract
The attenuation of RF pulses passing through a mineral slurry is determined by measuring the amplitude of the envelope produced by a series of successively occurring attenuated electrical pulses. The pulses are applied to the input of a variable gain amplifier, the gain of which is under control of a digital processor. The peak amplitude of each pulse is compared with a fixed reference voltage. The contents of a storage register associated with the processor is modified dependent upon whether the pulse amplitude is geater or less than the reference voltage. The contents of the register is used to control the gain of the variable gain amplifier in such a way that the amplitude of the next successive pulse will approach the value of the reference voltage. After the last pulse has been measured, the gain of the amplifier is inversely proportional to the amplitude of the pulse envelope, and the contents of the successive approximation register will also be proportional to the amplitude of the pulse envelope. The system may be calibrated using a precision attenuator to establish the degree of attenuation when no slurry is present.